Additive manufacturing (AM), also referred attractively as 3D printing, is a well-established process of creating complex 3D geometries through a layer-by-layer building approach. 3D printing has received considerable attention in automotive, aerospace, and biomedical sectors. Direct metal laser sintering (DMLS) is the most commonly used method for 3D printing of metals which involves selective laser sintering of layers of metal powders. However, the high capital cost, defects in the manufactured components and inability to work with multiple materials, limit 3D printing of metals by DMLS and warrant the development of novel non-laser based 3D printing techniques.
Electrochemical additive manufacturing (ECAM) (electrochemical 3D printing) involves deposition of thin and highly adherent layers of metal with a layer-by-layer approach onto a conducting surface through reduction of metal ions from the electrolyte. It combines the basic principles of electrodeposition and 3D printing. Two different approaches, viz., localized electrochemical deposition (LCD) and meniscus confined electrode (MCE), have been used for electrochemical 3D printing of metals. These methods, however, require the use of expensive piezo-based movement stages and nanopippettes/ultrafine electrodes. The slow rate deposition rate of metals (Cu: from ≈100 nm/s to ≈0.18 μm/s), inability to develop components of complex geometries, porosity and roughness are some of the major limitations. Moreover, majority of the structures fabricated using these methods are simple wire-based architectures. Methods for 3D electrochemical printing of metals with improved deposition rates and capable of printing complex structures are warranted. In this perspective, researchers at Dyson School of Design Engineering and Department of Earth Science and Engineering, Imperial College London, UK, have reported a novel strategy for ECAM using a MCE approach.
The electrochemical 3D printer assembly comprised of a plastic syringe and nozzle (diameter 400 μm) with a porous sponge filled with 1 M CuSO4 was mounted on a carriage and its movement in the x-, y- and z- directions was precisely controlled using computer controlled stepper motors. Two copper rods suspended in the CuSO4 electrolyte served as the counter and reference electrodes while a copper plate served as the working electrode. The print head was moved to contact the copper plate and retract back by a small amount. The sufficient back pressure provided by the porous sponge to the hydraulic head enabled the formation of a stable meniscus (localized electrolyte). When a positive potential was applied between the working and counter electrodes, deposition of Cu occurs on the working electrode through reduction of Cu2+ ions with a simultaneous replenishment of Cu2+ ions from the counter electrode. To create 3D printed structures, the print head was moved in x-, y- and z-directions with varying traverse speed as directed by the 3D model. The various components of the electrochemical 3D printer assembly is schematically represented in Figs. 1 (a), 1(b) and 1(c). Optical image of the 3D printed Cu with the shape of the letters “I”, “C”, and “L” using 1 M CuSO4 at 4 V at a print head speed of 0.4 mm/s is shown in Fig. 1(d).
Fig. 1 Schematic illustration of the electrochemical 3D printer assembly: (a) Print head set-up; (b) electrode arrangement; (c) print nozzle and sponge in the tip, highlighting how they act during the deposition of Cu; and (d) optical images of the printed Cu structures featuring the letters “I”, “C”, and “L” printed using 1 M CuSO4 at 4 V at a print head speed of 0.4 mm/s.
Electrochemical 3D printing of Cu dots and lines (lateral print head velocity: 0.4 mm/s) were made using 1 M CuSO4 as the electrolyte at varying voltages from 1 to 6 V for 1 h. The Cu dots printed at 1 V exhibited a dense structure with a high degree of concentricity. In spite of a faster rate of growth along with a dense structure, those printed at 2 V exhibited a convex shape due to preferential deposition at the center. Formation of Cu dendrites becomes apparent at 3V due to the limitations imposed by the mass transport and the a continuous increase in porosity is observed with a further increase in deposition potential (Fig. 2(a)). Hence, achieving dimensionally accurate structures would be difficult using electrochemical printing of Cu dots at potentials beyond 2 V. Irrespective of the deposition potentials in the rage of 1-6 V, electrochemically printed Cu lines fails to exhibit any Cu dendrites since the relative position of the print head aids mass transport of Cu2+ ions or might have assisted mechanical removal of the dendrites (Fig. 2(b)). The thickness of the Cu lines is increased from 3 μm at 1 V to 15 μm at 4 V, beyond which it decreased due to the decrease in deposition efficiency. For a given lateral speed of 0.4 mm/s for 3600 s, Cu lines can be printed for 144 passes over a distance of 10 mm.
Fig. 2 SEM images of (a) single Cu dot; and (b) Cu lines (lateral print head speed: 0.4 mm/s) electrochemically printed using 1 M CuSO4 at 3-6 V for 1 h
The electrochemical 3D printed Cu dots and Cu lines exhibit a higher hardness than cold worked cast Cu. The Vickers hardness of Cu dots varies from 184 to 196 MPa, Cu lines ranging from 211 to 228 MPa when compared to the hardness of cold worked cast Cu, which varies from 50 to 176 MPa; the smaller the grain size, the higher is the hardness. The electrical conductivity of Cu lines is ranging between 1.31×106 and 6.86×106 S/m, which agrees well with that of nanocrystalline Cu (5.41×106 S/m) but relatively lower than coarse grained Cu.
Electrochemical 3D printing of Cu builds a foundation for future work to achieve high speed deposition as well as printing of multi-metal functional structures. The z-height resolution opens up new avenues for the fabrication of functional electronics such as sensors.
T.S.N. Sankara Narayanan
For more information, the reader may kindly refer: Xiaolong Chen et al., A Low Cost Desktop Electrochemical Metal 3D Printer, Adv. Mater. Technol. 2017, 1700148, DOI: 10.1002/admt.201700148

Fig. 1 (a) Schematic of the Joule heating method for coating Ag NPs on CNFs (inset: morphology of CNFs prepared by electrospinning); (b) Digital image of the Joule heating set up. The sample was connected to Cu electrodes and heated by a current pulse in Ar-filled glove box.
Fig. 2 SEM images of Ag NPs deposited on CNFs by Joule heating method for (a) 0.05 s; (b) 0.5 s; and (c) 4 s.
Fig. 3 (a) Schematic of Li nucleation and growth seeded by Ag NPs on CNFs; (b-g) SEM images: (b) pristine AgNP/CNFs without Li deposition; (c) initial Li nucleation on AgNP/CNFs; (d) Li deposited on CNFs guided by Ag NPs at 1 mA h/cm2 of; (e) AgNP/CNFs after the first plating/stripping cycle: (f) bare CNFs without Ag nanoseeds; and (g) Li deposited on bare CNFs
Fig. 1 (a) Schematic of the porous Cu current collectors; (b–d) current density distribution on the surface of porous Cu collectors obtained from COSMOL simulation: (b) Cu-5-50-20; (c) Cu-5-50-16; (d) Cu-5-50-12; and (e) schematic diagram depicting preferential deposition of Li inside the mouth of channels.
Fig. 2 Morphology of Li deposits formed on porous and planar Cu current collectors: (a–d) SEM images of Li deposits formed on the porous Cu with varying pore radii: (a) 5 μm; (b) 7.5 μm; (c) 10 μm; (d) 15 μm; (e) SEM image of Li deposits form on the planar Cu; and (f) Voltage profiles of Li deposition on Cu current collectors.
Fig. 3 (a, b) Electrochemical performance of Li/LiFePO4 cells with (a) porous Cu-5-50-12 anode; and (b) planar Cu anode; and (c) cycling performance of the Li/LFP cells
Fig. 1 Preserving and stabilizing Li metal by cryo-transfer method: (a) Li metal dendrites are electrochemically deposited directly onto a Cu TEM grid and then plunged into liquid N2 after battery disassembly; and (b) The specimen is then placed onto the cryo-TEM holder while still immersed in liquid nitrogen and isolated from the environment by a closed shutter. During insertion into the TEM column, temperature is not increased > –170 °C, and the shutter prevents air exposure to the Li metal.
Fig. 2 (a) Cryo-TEM and (b) Cryo-SEM images of Li metal dendrites depicting that the morphology is preserved by the cryo-transfer method; (c to e) time-lapse images of Li dendrite; (f to h) growth of Li metal dendrites along: (f) <111>; (g) <110>; and (h) <211> directions.